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 Introdution 
 Process 
 Requirements 
 Various Nanowires 
 Control of Size 
 Precursors and catalysts
 VLS- Vapour Solid Liquid Growth 
 VLS is a method for growth of One-Dimensional Structure like Nanowires 
from Chemical Vapour Deposition. 
 The name VLS mechanism reflects the pathway of Si, which coming from 
the vapour phase diffuses through the liquid droplet and ends up as a 
solid Si wire.
o Take Silicon Wafer 
o Deposit a thin Au film(~1-10 nm) which act as catalyst 
Via Sputter deposition or thermal evaporation 
o Silicon + Gold 385 C Liquid Mixture(Droplet) 
o Silicon Species evaporate 
o Diffusion (Liquid-Vapour Interface ) 
o Condense Liquid Droplet 
o Supersaturation 
o Precipitate (Solid-Liquid Interface) 
o Nucleation 
o Crystal Growth in unidirection ( Solid-Liquid Interface)
 Must form Liquid solution 
 Distribution coefficient must be less than unity 
 Equilibrium vapour Pressure over liquid droplet 
must be small 
 Physically active but Chemically inert 
 Solid solubility must be low
 Solid-Liquid interface must be well defined 
crystallographically 
 General Supersaturation should kept relatively low 
 For Cylindrical shape: 
Lateral Growth rate < Longitudinal Growth rate
For Si Nanowires: 
 Catalyst-Mixture of silicon powder with 5 wt% Fe 
 Temp-1200 C 
 Nanowire Diameter ~15nm 
 Nanowire Length – few 10 to several 100 micrometers 
 Amorphose oxide layer of ~2nm over coated the 
outside of silicon nanowires 
For GaAs Nanowires: 
 Catalyst- Gold, Silver & Copper
Size of Nanowire ~ Liquid Catalyst Droplet ~ Layer thickness of Catalyst 
 For 10nm Au size~ Germanium nanowire 150nm 
 For 5nm Au size~ Germanium nanowire 80nm 
 Further Reduction ~ No Change 
Use of Monosized catalyst colloids: 
Size of Nanowire ~ Catalyst nanoclusters 
 For 28.2 nm diameters Gold colloids ~ 30.2 nm GaP nanowires 
 For 18.5 nm diameters Gold colloids ~ 20.0 nm GaP nanowires 
 For 8.4 nm diameters Gold colloids ~ 11.4 nm GaP nanowires 
 Further Reduction ~ Small Droplet ~ High Solubility ~ High Supersaturation 
Results in Lateral Growth on side surface 
Nanowires like conical structure
For Silicon Nanowires: 
 Gaseous Precursors: SiCl4 
For Ge Nanowires: 
 Precursors: Ge(s) + GeI4(g)  2GeI2(g) 
 In Liquid Catalyst: 2GeI2  Ge(l) + GeI4(g) 
ZnO Nanowires: 
 Catalyst: Au coated ~2-50nm 
 1:1 mixture of ZnO & Graphite powder 
 Temp:900-925 C 
 Constant flow of argon ~ 5-30min 
ZnO + C Zn + CO 
 Au Coating of 50 nm ~ 80-120 nm Nanowires diameter~ 10-20 μm length 
 Au Coating of 3 nm ~ 40-70 nm Nanowires diameter ~ 5-10 μm length

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Vapour Solid Liquid Growth

  • 1.
  • 2.  Introdution  Process  Requirements  Various Nanowires  Control of Size  Precursors and catalysts
  • 3.  VLS- Vapour Solid Liquid Growth  VLS is a method for growth of One-Dimensional Structure like Nanowires from Chemical Vapour Deposition.  The name VLS mechanism reflects the pathway of Si, which coming from the vapour phase diffuses through the liquid droplet and ends up as a solid Si wire.
  • 4. o Take Silicon Wafer o Deposit a thin Au film(~1-10 nm) which act as catalyst Via Sputter deposition or thermal evaporation o Silicon + Gold 385 C Liquid Mixture(Droplet) o Silicon Species evaporate o Diffusion (Liquid-Vapour Interface ) o Condense Liquid Droplet o Supersaturation o Precipitate (Solid-Liquid Interface) o Nucleation o Crystal Growth in unidirection ( Solid-Liquid Interface)
  • 5.
  • 6.  Must form Liquid solution  Distribution coefficient must be less than unity  Equilibrium vapour Pressure over liquid droplet must be small  Physically active but Chemically inert  Solid solubility must be low
  • 7.  Solid-Liquid interface must be well defined crystallographically  General Supersaturation should kept relatively low  For Cylindrical shape: Lateral Growth rate < Longitudinal Growth rate
  • 8. For Si Nanowires:  Catalyst-Mixture of silicon powder with 5 wt% Fe  Temp-1200 C  Nanowire Diameter ~15nm  Nanowire Length – few 10 to several 100 micrometers  Amorphose oxide layer of ~2nm over coated the outside of silicon nanowires For GaAs Nanowires:  Catalyst- Gold, Silver & Copper
  • 9. Size of Nanowire ~ Liquid Catalyst Droplet ~ Layer thickness of Catalyst  For 10nm Au size~ Germanium nanowire 150nm  For 5nm Au size~ Germanium nanowire 80nm  Further Reduction ~ No Change Use of Monosized catalyst colloids: Size of Nanowire ~ Catalyst nanoclusters  For 28.2 nm diameters Gold colloids ~ 30.2 nm GaP nanowires  For 18.5 nm diameters Gold colloids ~ 20.0 nm GaP nanowires  For 8.4 nm diameters Gold colloids ~ 11.4 nm GaP nanowires  Further Reduction ~ Small Droplet ~ High Solubility ~ High Supersaturation Results in Lateral Growth on side surface Nanowires like conical structure
  • 10. For Silicon Nanowires:  Gaseous Precursors: SiCl4 For Ge Nanowires:  Precursors: Ge(s) + GeI4(g)  2GeI2(g)  In Liquid Catalyst: 2GeI2  Ge(l) + GeI4(g) ZnO Nanowires:  Catalyst: Au coated ~2-50nm  1:1 mixture of ZnO & Graphite powder  Temp:900-925 C  Constant flow of argon ~ 5-30min ZnO + C Zn + CO  Au Coating of 50 nm ~ 80-120 nm Nanowires diameter~ 10-20 μm length  Au Coating of 3 nm ~ 40-70 nm Nanowires diameter ~ 5-10 μm length