The Vertex is a plasma characterisation instrument that measures the ion angular distribution of Ions arriving at a surface inside a plasma chamber. It can also measure ion energy, ion flux, negative ions, temperature and Vdc at a surface inside a plasma. The Vertex System is increasingly used in many applications in industry and research, such as plasma etching, ion beams, and plasma sputtering for plasma characterisation and plasma interaction analysis. The Vertex System saves the user valuable time in confirming models, developing new processes and in experiments that use plasma, plasma tool design and plasma research.

1. VERTEX | SYSTEM
“Ion angular distribution
can now be measured at
the substrate position”

2. VERTEX | SYSTEM
The Vertex Single Sensor is
placed at any location inside a
plasma reactor and measures
the ion angular distribution
hitting a surface using a single
sensor.
The Vertex Multi Sensor also
measures the uniformity of ion
angle distribution hitting a
surface inside a plasma reactor
from multiple locations.

3. VERTEX | SYSTEM
Plasma Parameters
Ion Angle Distribution
Ion Energy Distribution • Ion Flux
Negative Ions • Temperature
Bias Voltage (Vdc)
Measurement Functionality
Time Averaged • Time Resolved • Time Trend
Solutions
The Vertex measures the angular distribution of
ions hitting a surface inside a plasma chamber.
These plasma diagnostics help with common
issues such as:
Feature damage
Beam divergence
Elastic scattering
The system also measures the ion energy
distribution and ion flux at each angular
distribution

4. VERTEX | SYSTEM
Installation Setup
Generator Match Plasma Reactor Vertex Electronics
Computer
Vertex Sensor

5. VERTEX | SYSTEM
How It Works
The first grid prevents the plasma entering the
analyser
The second grid is biased with a negative potential
to repel any electrons
A third grid is biased with a positive potential
sweep. This creates a potential barrier for the
positive ions
An aperture is located directly below the third grid
which allows through ions of a specific angle
A second aperture is biased with a potential to
modify its ion acceptance angle
A collector plate collects the current of ions which
cross the potential barrier set by the third grid

6. VERTEX | SYSTEM
Applications
The Vertex finds uses where ion angular distribution is of interest.
The Vertex System can be used in the following applications:
Dusty Plasma
Plasma Etching
HiPIMS Plasma
Ion Beam Plasma
PECVD
Space Plasma
Plasma Sputtering

7. VERTEX | SYSTEM
Applications
For further information on the Vertex System visit
impedans.com/vertex-sensor
To request a quote visit
www.impedans.com/contact

8. Chase House
City Junction Business Park
Northern Cross
Malahide Road
Dublin 17
Ireland
Ph: +353 1 842 8826
Fax: +353 1 891 6519
Web: www.impedans.com
Email: info@impedans.com