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6th Industrial Symposium on
                        Nanoimprint Lithography
                        23 May 2012 | 0900-1400 | IMRE SR1

                                                                    Confirmed Invited International
SCOPE OF SYMPOSIUM                                                         Speakers from:

The past five annual industry symposia on nanoimprint
lithography have been excellent sources of information for
corporate attendees of all stripes, from potential end-users to
value-chain enterprises, seeking to stay abreast of the latest
developments in the field. The 6th Industrial Symposium on
Nanoimprint Lithography, 2012 will emphasize commercial
applications that are closest to production.        International
speakers from companies with interests in nanoimprint
technology will emphasize this theme, as well as convey recent
developments in their respective businesses.       Furthermore,
there will be corporate exhibits showcasing the latest products
produced by and for nanoimprint technology. The symposium
is intended as a platform to foster partnership and explore new
collaborations with industry.




Chair                Hong Yee LOW
                     Institute of Materials Research and
                     Engineering, Singapore

Co-chair &           Jaslyn LAW
Correspondence       Institute of Materials Research and
                     Engineering, Singapore
                     3 Research Link, Singapore 117602
                     Tel: (65) 6874 7902;
                     Email: lawj@imre.a-star.edu.sg




REGISTRATION                                                                Organized by:
Register online by 21 May 2012 at:
http://www.imre.a-star.edu.sg/events.php?id=B531O538N534
Registration is free, however pre-registration is compulsory.

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6th nanoimprint symposium

  • 1. 6th Industrial Symposium on Nanoimprint Lithography 23 May 2012 | 0900-1400 | IMRE SR1 Confirmed Invited International SCOPE OF SYMPOSIUM Speakers from: The past five annual industry symposia on nanoimprint lithography have been excellent sources of information for corporate attendees of all stripes, from potential end-users to value-chain enterprises, seeking to stay abreast of the latest developments in the field. The 6th Industrial Symposium on Nanoimprint Lithography, 2012 will emphasize commercial applications that are closest to production. International speakers from companies with interests in nanoimprint technology will emphasize this theme, as well as convey recent developments in their respective businesses. Furthermore, there will be corporate exhibits showcasing the latest products produced by and for nanoimprint technology. The symposium is intended as a platform to foster partnership and explore new collaborations with industry. Chair Hong Yee LOW Institute of Materials Research and Engineering, Singapore Co-chair & Jaslyn LAW Correspondence Institute of Materials Research and Engineering, Singapore 3 Research Link, Singapore 117602 Tel: (65) 6874 7902; Email: lawj@imre.a-star.edu.sg REGISTRATION Organized by: Register online by 21 May 2012 at: http://www.imre.a-star.edu.sg/events.php?id=B531O538N534 Registration is free, however pre-registration is compulsory.