nano lithography technique for fabrication of semiconductor devices and microelectronics

1. NANOLITHOGRAPHY
TECHNIQUES
FOR NANO SCALE
FABRICATION
DONE BY:
GIRISH RAGHUNATHAN
1RV18MMD07 1

2. OUTLINE
• Introduction
• Photolithography
• Electron Beam Lithography
• X Ray Lithography
• Nano imprint Lithography
• Dip pen lithography
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3. INTRODUCTION
• Nanolithography is the branch of nanotechnology concerned
with the study and application of fabricating nanometer-scale
structures.
• Nanos –dwarf
• Lithos- stone
• Graphein- to write
• Roughly nanolithography translates into ‘tiny writing on stone’
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4. PHOTOLITHOGRAPHY
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STEPS IN PHOTOLITHOGRAPHY :
1) WATER CLEANING
2) BARRIER LAYER FORMATION
3) PHOTORESIST APPLICATION
4) PRE BAKING
5) MASK ALIGNMENT AND EXPOSURE
6) DEVELOPMENT
7) HARD BAKING
8) ETCHING
9) STRIPPING Fig 1: Photolithography Process

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Fig 2: Spin coating of resist

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Fig 3: Photolithography Process

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Fig 4: Photolithography Process

8. ELECTRON BEAM NANOLITHOGRAPHY
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Fig 5:Electron Beam Nanolithography

9. X- RAY NANOLITHOGRAPHY
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Fig 6: X RAY nanolithography
Fig 7: Sample
fabricated by
X ray
nanolithography

10. NANO IMPRINT LITHOGRAPHY
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Fig 8: Nano Imprint Lithography

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Fig 9,10: Nano imprint lithography

12. DIP PEN NANOLITHOGRAPHY
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Fig 11: Dip pen nanolithography
Process
Fig 12: Sample fabricated by dip pen
nano
lithography Process

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Fig 13: Photolithography Process

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Fig 14: Atomic Force microscopy

15. REFERENCES
• M. Feldman, 2013, “Nanolithography, The Art of Fabricating
Nanoelectronic and Nanophotonic Devices and Systems”,1st
edition.
• Dhara Parikh, Barry Craver, Hatem N. Nounu, Fu-On Fong, and
John C. Wolfe, "Nanoscale Pattern Definition on Nonplanar
Surfaces Using Ion Beam Proximity Lithography and Conformal
Plasma-Deposited Resist", Journal of Microelectromechanical
Systems, VOL. 17, NO. 3, JUNE 2008
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