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SOFICSformerly known as Sarnoff Europe July 2009 Pieter Donck
TakeCharge used by >30 customers and licensees IDM – Fabless – Foundry partners Sofics © 2009 Proprietary & Confidential 2
TakeCharge ESD implemented in >500 ICs TakeCharge milestones Since 2002: >500 volume production ICs reported Product proven in 8 CMOS generations, BiCMOS, BCD… Partnerships with major and specialty foundries July 2008: 40nm ESD solutions validated in silicon Sofics © 2009 Proprietary & Confidential 3
TakeCharge complements ESD portfolio TakeCharge: complementary solutions Augment available portfolio Focus on custom or specialty requirements High speed applications Low leakage for green/mobile applications High ESD performance requirements Special analog requirements Small silicon area clamps Full chip implementation support Sofics © 2009 Proprietary & Confidential 4 Standard logic ESD-circuit matching Low capacitance High ESD requirement Interdomain / core issues
TakeCharge Engagement models ESD test service ESD analysis or qualification for your ASIC ESD consulting service  Solve ESD issues, increase ESD confidence, quickly! TakeCharge Design Kits (TDK)  Comprehensive solution set for 180nm – 40nm Optimize ESD independently from SOFICS. TakeCharge Technology transfer Consistently realize first-time-right, optimized, robust ESD design Independently migrate ESD solutions to multiple processes Sofics © 2009 Proprietary & Confidential 5
TakeCharge ServiceESD TEST SERVICE Sofics © 2009 Proprietary & Confidential 6
SOFICS has a state-of-the-art ESD lab Fully equipped ESD test lab HBM ANSI/ESDA and JEDEC on packaged dies MM ANSI/ESDA and JEDEC on packaged dies Latch-up JEDEC on packaged dies TLP (2) on packaged and bare dies VF-TLP on bare dies with high current RF probes Probe stations (3) DC leakage and IV tracing on packaged and bare dies Solid state pulsing on packaged and bare dies Thermo chuck Test boards and sockets for various packages Sofics © 2009 Proprietary & Confidential 7
ESD test equipment  ESD related equipment HBM, MM, latch-up: 	Keytek Mk.2 TLP: 		BEI 4002 TLP: 75ns and 100ns pulse width VF-TLP: 		BEI 4012 VF-TLP: 1 ns, 2ns, 5ns, 10ns pulse width DC / latch-up equipment Parametric analyzer:	Keithley 4200 Curve tracer: 	Tektronix Type 576 High temperature	Micromanipulator Sofics © 2009 Proprietary & Confidential 8
ESD, DC Analysis TLP, VFTLP, DC (parametric, curve tracer) Wafer or bare dies ESD Qualification HBM, MM, TLP, Latch-up Packaged samples DIL16 - DIL48 QFP208 Sofics © 2009 Proprietary & Confidential 9
TakeCharge cells Sofics © 2009 Proprietary & Confidential 10
TDK cells – Product proven ESD clamps Approach Purchase selected ESD clamps Single clamp or single voltage domain GDSII layout file, LVS netlist 1 page description (connection guidelines, ESD behavior) Dual diode included for ‘domain’ purchases Customization services available Increase ESD performance Change metallization Change aspect ratio Cells for custom requirements available on request Customer integrates ESD clamps Implementation review services available Sofics © 2009 Proprietary & Confidential 11
TDK ESD cells for foundry processes  Silicon and product verified ESD clamps: TSMC 350nm HV – 180nm – 130nm – 90nm – 65nm – 40nm UMC 180nm HV – 130nm – 65nm Tower 130nm – 350nm Other  Fujitsu 65nm – Epson 130nm Chartered 65nm: qualification on-going Various other cells available Other voltage domains, process nodes, or foundries Sofics © 2009 Proprietary & Confidential 12
TDK cells – Topology / clamp types Clamp types available Core protection IO clamps Input protection Output protection IO protection Special cells Low capacitive Overvoltage tolerant (OVT) Area information Includes guard bands and reverse diode ‘Both directions’ includes 2 local clamps and dual diode Sofics © 2009 Proprietary & Confidential 13 VDD IO  Circuit PAD RISO IO  Circuit VSS
Key benefits with TakeCharge solutions Key technical benefits Area efficient solutions Win business, volume and margins Scalable ESD performance  Reach any ESD requirement Low leakage and Latch-up immune No interruption of normal operation Tunable trigger voltage and current Complete solution package.  Protection of Analog IO’s No process changes for ESD solutions ‘Over voltage’ and ‘under voltage’ tolerant options Optimization through calculation tool Sofics © 2009 Proprietary & Confidential 14
Calculation tool Sofics © 2009 Proprietary & Confidential 15
Straightforward path to optimized ESD solutions TakeCharge ESD calculation tool Clear visualization & navigation Design guidance Automatic w/ pre-selections Design window calculation(any circuit-to-be-protected) Performance check Design optimization Full IC consideration Trade offs Capacitance, area, leakage,bus resistance… Sofics © 2009 Proprietary & Confidential 16
Calculation tool Growing difficulty for ESD protection Advanced CMOS, Complex System-on-Chip designs Beyond standard ESD requirements Analog design requirements (capacitance, leakage) Solutions: ESD design tool Step-wise, easy to use GUI Easily compare different protection strategies Optimize functional – ESD trade-offs Based on on-Chip ESD IP blocks Customized per technology node and foundry Silicon proven IP in 8 CMOS generations and >500 IC’s Sofics © 2009 Proprietary & Confidential 17
Advanced CMOS Sofics © 2009 Proprietary & Confidential 18
TakeCharge – experience in advanced CMOS SOFICS experience in advanced IC applications SerDes IO’s in FPGA’s: 		180nm – 40nm 10Gbps Optical communications: 	130nm – 180nm HDMI:				130nm USB 2.0:			130nm – 90nm Serial ATA:			130nm – 90nm ASICs:				180nm – 65nm ... Sofics © 2009 Proprietary & Confidential 19
TakeCharge – flexible ESD solutions TakeCharge ESD protection Tunable trigger voltage Vt1 External, exchangable trigger elements Tunable holding voltage Vhold Latch-up immunity Tunable failure current It2, Imax Any ESD specification possible Low dynamic resistance Ron Design margin for full chip ESD Low capacitive For high speed IOs Low leakage  Sofics © 2009 Proprietary & Confidential 20 Current Vdd Vmax Vburn-in It2 Imax Damage of IO  or core RON Voltage Vhold Vt1
Universal power clamp Sofics © 2009 Proprietary & Confidential 21
ESD protection for High Voltage applications Various ESD protection clamps in use (overview 1/2) HV NMOS: RC-BigFet Large silicon area, high leakage Tuning is difficult for high voltage processes HV NMOS bipolar: double snapback Low ESD robustness – non-uniform ESD current conduction & degradation Large silicon area, high leakage Latch-up due to deep snapback HV PMOS bipolar: no snapback Large silicon area, high leakage Limited portability between fabs and processes Large voltage drop during ESD stress Sofics © 2009 Proprietary & Confidential 22
ESD protection for High Voltage applications Various ESD protection clamps in use (overview 2/2) Zener diode: reverse diode conduction Large silicon area, high leakage Large voltage drop during ESD stress High BD voltage – small margin for core protection HHI-SCR: SOFICS proprietary High ESD robustness in smallest area Tunable trigger conditions (Vt1, It1, Ihold) Latch-up free up-to predefined current level Universal HV power clamp: SOFICS proprietary High ESD robustness in smallest area Tunable device for triggering and clamping Latch-up immune for all current levels Sofics © 2009 Proprietary & Confidential 23 AREA COMPARISON Zener100% PMOS50% SOFICS10% - HHI-SCR - Universal HV clamp
Contact Us TakeCharge Technology Bart Keppens 		bkeppens@sofics.com Benjamin Van Camp		bvancamp@sofics.com TakeCharge Business Pieter Donck		pdonck@sofics.com Koen Verhaege		kverhaege@sofics.com Sofics Brugsebaan 188A, B-8470 Gistel, BELGIUM (tel) +32-59-275-915, (fax) +32-59-275-916 www.sofics.com Sofics © 2009 Proprietary & Confidential 24

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Sofics Linkedin

  • 1. SOFICSformerly known as Sarnoff Europe July 2009 Pieter Donck
  • 2. TakeCharge used by >30 customers and licensees IDM – Fabless – Foundry partners Sofics © 2009 Proprietary & Confidential 2
  • 3. TakeCharge ESD implemented in >500 ICs TakeCharge milestones Since 2002: >500 volume production ICs reported Product proven in 8 CMOS generations, BiCMOS, BCD… Partnerships with major and specialty foundries July 2008: 40nm ESD solutions validated in silicon Sofics © 2009 Proprietary & Confidential 3
  • 4. TakeCharge complements ESD portfolio TakeCharge: complementary solutions Augment available portfolio Focus on custom or specialty requirements High speed applications Low leakage for green/mobile applications High ESD performance requirements Special analog requirements Small silicon area clamps Full chip implementation support Sofics © 2009 Proprietary & Confidential 4 Standard logic ESD-circuit matching Low capacitance High ESD requirement Interdomain / core issues
  • 5. TakeCharge Engagement models ESD test service ESD analysis or qualification for your ASIC ESD consulting service Solve ESD issues, increase ESD confidence, quickly! TakeCharge Design Kits (TDK) Comprehensive solution set for 180nm – 40nm Optimize ESD independently from SOFICS. TakeCharge Technology transfer Consistently realize first-time-right, optimized, robust ESD design Independently migrate ESD solutions to multiple processes Sofics © 2009 Proprietary & Confidential 5
  • 6. TakeCharge ServiceESD TEST SERVICE Sofics © 2009 Proprietary & Confidential 6
  • 7. SOFICS has a state-of-the-art ESD lab Fully equipped ESD test lab HBM ANSI/ESDA and JEDEC on packaged dies MM ANSI/ESDA and JEDEC on packaged dies Latch-up JEDEC on packaged dies TLP (2) on packaged and bare dies VF-TLP on bare dies with high current RF probes Probe stations (3) DC leakage and IV tracing on packaged and bare dies Solid state pulsing on packaged and bare dies Thermo chuck Test boards and sockets for various packages Sofics © 2009 Proprietary & Confidential 7
  • 8. ESD test equipment ESD related equipment HBM, MM, latch-up: Keytek Mk.2 TLP: BEI 4002 TLP: 75ns and 100ns pulse width VF-TLP: BEI 4012 VF-TLP: 1 ns, 2ns, 5ns, 10ns pulse width DC / latch-up equipment Parametric analyzer: Keithley 4200 Curve tracer: Tektronix Type 576 High temperature Micromanipulator Sofics © 2009 Proprietary & Confidential 8
  • 9. ESD, DC Analysis TLP, VFTLP, DC (parametric, curve tracer) Wafer or bare dies ESD Qualification HBM, MM, TLP, Latch-up Packaged samples DIL16 - DIL48 QFP208 Sofics © 2009 Proprietary & Confidential 9
  • 10. TakeCharge cells Sofics © 2009 Proprietary & Confidential 10
  • 11. TDK cells – Product proven ESD clamps Approach Purchase selected ESD clamps Single clamp or single voltage domain GDSII layout file, LVS netlist 1 page description (connection guidelines, ESD behavior) Dual diode included for ‘domain’ purchases Customization services available Increase ESD performance Change metallization Change aspect ratio Cells for custom requirements available on request Customer integrates ESD clamps Implementation review services available Sofics © 2009 Proprietary & Confidential 11
  • 12. TDK ESD cells for foundry processes Silicon and product verified ESD clamps: TSMC 350nm HV – 180nm – 130nm – 90nm – 65nm – 40nm UMC 180nm HV – 130nm – 65nm Tower 130nm – 350nm Other Fujitsu 65nm – Epson 130nm Chartered 65nm: qualification on-going Various other cells available Other voltage domains, process nodes, or foundries Sofics © 2009 Proprietary & Confidential 12
  • 13. TDK cells – Topology / clamp types Clamp types available Core protection IO clamps Input protection Output protection IO protection Special cells Low capacitive Overvoltage tolerant (OVT) Area information Includes guard bands and reverse diode ‘Both directions’ includes 2 local clamps and dual diode Sofics © 2009 Proprietary & Confidential 13 VDD IO Circuit PAD RISO IO Circuit VSS
  • 14. Key benefits with TakeCharge solutions Key technical benefits Area efficient solutions Win business, volume and margins Scalable ESD performance Reach any ESD requirement Low leakage and Latch-up immune No interruption of normal operation Tunable trigger voltage and current Complete solution package. Protection of Analog IO’s No process changes for ESD solutions ‘Over voltage’ and ‘under voltage’ tolerant options Optimization through calculation tool Sofics © 2009 Proprietary & Confidential 14
  • 15. Calculation tool Sofics © 2009 Proprietary & Confidential 15
  • 16. Straightforward path to optimized ESD solutions TakeCharge ESD calculation tool Clear visualization & navigation Design guidance Automatic w/ pre-selections Design window calculation(any circuit-to-be-protected) Performance check Design optimization Full IC consideration Trade offs Capacitance, area, leakage,bus resistance… Sofics © 2009 Proprietary & Confidential 16
  • 17. Calculation tool Growing difficulty for ESD protection Advanced CMOS, Complex System-on-Chip designs Beyond standard ESD requirements Analog design requirements (capacitance, leakage) Solutions: ESD design tool Step-wise, easy to use GUI Easily compare different protection strategies Optimize functional – ESD trade-offs Based on on-Chip ESD IP blocks Customized per technology node and foundry Silicon proven IP in 8 CMOS generations and >500 IC’s Sofics © 2009 Proprietary & Confidential 17
  • 18. Advanced CMOS Sofics © 2009 Proprietary & Confidential 18
  • 19. TakeCharge – experience in advanced CMOS SOFICS experience in advanced IC applications SerDes IO’s in FPGA’s: 180nm – 40nm 10Gbps Optical communications: 130nm – 180nm HDMI: 130nm USB 2.0: 130nm – 90nm Serial ATA: 130nm – 90nm ASICs: 180nm – 65nm ... Sofics © 2009 Proprietary & Confidential 19
  • 20. TakeCharge – flexible ESD solutions TakeCharge ESD protection Tunable trigger voltage Vt1 External, exchangable trigger elements Tunable holding voltage Vhold Latch-up immunity Tunable failure current It2, Imax Any ESD specification possible Low dynamic resistance Ron Design margin for full chip ESD Low capacitive For high speed IOs Low leakage Sofics © 2009 Proprietary & Confidential 20 Current Vdd Vmax Vburn-in It2 Imax Damage of IO or core RON Voltage Vhold Vt1
  • 21. Universal power clamp Sofics © 2009 Proprietary & Confidential 21
  • 22. ESD protection for High Voltage applications Various ESD protection clamps in use (overview 1/2) HV NMOS: RC-BigFet Large silicon area, high leakage Tuning is difficult for high voltage processes HV NMOS bipolar: double snapback Low ESD robustness – non-uniform ESD current conduction & degradation Large silicon area, high leakage Latch-up due to deep snapback HV PMOS bipolar: no snapback Large silicon area, high leakage Limited portability between fabs and processes Large voltage drop during ESD stress Sofics © 2009 Proprietary & Confidential 22
  • 23. ESD protection for High Voltage applications Various ESD protection clamps in use (overview 2/2) Zener diode: reverse diode conduction Large silicon area, high leakage Large voltage drop during ESD stress High BD voltage – small margin for core protection HHI-SCR: SOFICS proprietary High ESD robustness in smallest area Tunable trigger conditions (Vt1, It1, Ihold) Latch-up free up-to predefined current level Universal HV power clamp: SOFICS proprietary High ESD robustness in smallest area Tunable device for triggering and clamping Latch-up immune for all current levels Sofics © 2009 Proprietary & Confidential 23 AREA COMPARISON Zener100% PMOS50% SOFICS10% - HHI-SCR - Universal HV clamp
  • 24. Contact Us TakeCharge Technology Bart Keppens bkeppens@sofics.com Benjamin Van Camp bvancamp@sofics.com TakeCharge Business Pieter Donck pdonck@sofics.com Koen Verhaege kverhaege@sofics.com Sofics Brugsebaan 188A, B-8470 Gistel, BELGIUM (tel) +32-59-275-915, (fax) +32-59-275-916 www.sofics.com Sofics © 2009 Proprietary & Confidential 24