2. Nano Fusion Technologies, Inc.
Founders and Managements
Tihiro Ohkawa (Founder)
Masana Nishikawa (Founder)
Ichiro Yanagisawa (CEO/CTO)
Masataka Ogawa (VP, Business Development)
Major Shareholders (Founders & VCs)
Yasuda Enterprise Development Co., Ltd (Japan)
Conduit Ventures Limited (UK)
4 Japanese VCs
Founded: March 15, 2004
Capital: 229,750,000 yen
Headquarters: 2-21-7, Naka-cho, Meguro-ku, Tokyo, Japan
Laboratory: B-M202 Collaborative Research Bldg. (CCR)
Institute of Industrial Science, the University of Tokyo
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3. Objective
NFT Objective:
Offer micro fluid delivery solutions with unique micro pumps and
micro-fluidic control devices to advance bio-science and micro-
electronics functions.
Major Technologies:
Micro electro-osmotic pump (Micro EO pumps)
Micro-fluidic control devices and systems
Application Area:
Bio-Science, Environmental and Chemical Applications
mTAS / Analytical device
Pipetting / Dispensing
Drug delivery (infusion)
Micro Electronics
Micro Fuel Cell & others
Industrial (lubrication, etc.)
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4. Principle of micro EO pump
Liquid - Electro-osmotic Pump - Inside ceramic disc
Ceramic particle Liquid
Liquid
Porous
Electric field
ceramic EOF
disc
Voltage
(dielectric
Porous
material)
material
Electrodes
Nozzle Pumping
Electro-osmotic Flow (EOF)-generating mechanism Interface Liquid
I. Negative charges on the dielectric material surface.
II. Excessive positive charges generated in the liquid
Flow
Electric field
near the liquid-ceramics interface.
III. The applied electric field would force the positively
charged liquid layer to flow, that drags the whole
liquid.
Electro-osmotic flow (EOF) Dielectric material (Ceramics)
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9. LFHP (evaluation sample)
- For high pressure or extremely low flow rate -
Performance of LFHP
9
1) High pressure performance up to 2,000kPa (at 60 Volts)
8
2) Extremely low flow rate (around 100 nL/min) 7 Working liquid:
Flow rate (μL/min)
3) Standard fitting design compatible with Upchurch fitting 6 De-ionized water
4) Extendable reservoir design 5
60V
4
3
LFHP
Model
2
24V
Pumping principle1) Electro-osmosis 1
8μL/min
Max.Flow rate2) 0
0 1000 2000 3000
Max.Pressure3) @DC 60V5) 2000kPa
Back pressure (kPa)
Power consumption4) 15mW
De-ionized water
Working liquid
Material PPS
Body size Diameter 10.3mm,length 27.3mm
Nozzle port Upchurch NanoPort Assemblies
F-333Nx
Nozzle fitting Upchurch NanoPort Assemblies
N-333-01
Weight 1.8g
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10. PWM Power Source and Controller
for Micro EO Pump (PS-PWM-24)
Enable stable micro-flow
by micro Electro-osmotic pump
1) PWM power source
2) Easy operation from Personal Computer
3) Built-in Feedback Control Function
PS-PWM-24 PS-PWM4C-24
Model
Output voltage1) 24V max
Duty ratio 0~100%
Pulse-frequency Variable (10~2000Hz)
Resolution of voltage 6mV
Power supply USB bus power AC adaptor
Input 100-240V 50/60Hz 0.3A
Output DC5V 2A
Output current 50mA max 50mAmax/1 channel
Number of I/O channel 1 4
Size(W×D×H) 85×55×21mm 85×55×48mm
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11. Evaluation Kits for micro EO pump
Evaluation Kits for full EO pump testing
Include all necessary components (pumps, power supply, flow sensor,
reservoirs and so on)
Evaluation Kits for different flow rate ranges
Low flow/High pressure kits (EVK-001) 0.1-1.5μL/min (-2000kPa)
Middle flow kits (EVK-002) 5-50μL/min
High flow kits (EVK-003) 100-1000μL/min
Low flow/High pressure kits EVK-001 formation High flow kits EVK-003 formation
Power supply PS-PWM4C-24
Reservoir for RP20-SP
Connecter
Power supply PS-PWM-24
Reservoir
Filter
LFHP
Tube (Teflon)
RP20-SP
Connecter
Flow sensor LG16-0025A
Reservoir Flow sensor LG16-1000A
Tube (Teflon)
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12. EO Pumps on a Micro-Channel Chip
Basic Concept
Direct mount on micro-channel chips (Pump-on-chip)
Integrated pump (Reservoir-on-pump)
Less redundant space
Reservoir
Less sample fluid
Precise flow rate &
flow amount control
EO Pump
Micro-channel chip
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15. Thank You
Nano Fusion Technologies, Inc.
Headquarters: (Mailing address)
Nano Fusion Technologies, Inc.
2-21-7 Naka-cho, Meguro-ku, Tokyo 153-0065
JAPAN
e-mail: nft-info@nft-eop.co.jp
Website: http://www.nft-eop.co.jp/
Laboratory:
B-M202 Collaborative Research Bldg. (CCR)
Institute of Industrial Science, the University of Tokyo
4-6-1 Komaba, Meguro-ku, Tokyo 153-8505
JAPAN
TEL: +81-3-5452-6619 FAX: +81-3-5452-6620
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